Perspective on stresses in magnetron-sputtered thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 12, Issue 4, 1994, Pages 953-961

  Hoffman, D W ^a  

^a FORD RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84967805393     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579073     Document Type: Conference Paper

References (16)

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4. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. 14, 164 (1977).
5. D. W. Hoffman and J. A. Thornton, Thin Solid Films 45, 387 (1977).
6. D. W. Hoffman and J. A. Thornton, J. Vac. Sci. Technol. 17, 380 (1980).
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8. D. W. Hoffman, Thin Solid Films 107, 353 (1983).
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11. D. W. Hoffman, Thin Solid Films 96, 217 (1982).
12. D. W. Hoffman and J. A. Thornton, J. Vac. Sci. Technol. 17, 380 (1980).
13. D. W. Hoffman and M. R. Gaerttner, J. Vac. Sci. Technol. 17, 425 (1980).
14. D. W. Hoffman and J. A. Thornton, J. Vac. Sci. Technol. 20, 355 (1982).
15. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. A 3, 576 (1985).
16. H. Ljungcrantz, L. Hultman J.-E. Sundgren, S. Johansson, N. Kristensen, J.-A. Schweitz, and C. J. Shute, J. Vac. Sci. Technol. A 11, 543 (1993).