Hydrogen-related mechanical stress in amorphous silicon and plasma-deposited silicon nitride

Thin Solid Films

Volumn 110, Issue 4, 1983, Pages 291-304

  Paduschek, P ^a   Hopfl Ch ^a   Mitlehner, H ^b  

^a Fraunhofer Institut fur Festkorpertechnologie   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; PLASMA DEVICES;

SILICON NITRIDE;

SEMICONDUCTING SILICON;

EID: 0020896058     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(83)90510-2     Document Type: Article

References (21)

1. Infrared Spectrum and Structure of Hydrogenated Amorphous Silicon
2. Calculation of stress in electrodeposits from the curvature of a plated strip