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Journal of Applied Physics

Volumn 46, Issue 1, 1975, Pages 112-117

The origin of internal stress in low-voltage sputtered tungsten films

(3) Sun, R C a Tisone, T C a Cruzan, P D a

a LUCENT TECHNOLOGIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS;

TUNGSTEN AND ALLOYS;

EID: 0016436562 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.322250 Document Type: Article

Times cited : (62)

References (14)

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- Sun, R.C.¹ Tisone, T.C.² Cruzan, P.D.³

9
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- Taylor, A.J.¹ Sinclair, H.²

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- (1948) Metal Handbook

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14
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- Petroff, P.¹ Sheng, T.T.² Sinha, A.K.³ Rozgonyi, G.A.⁴ Alexander, F.B.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.