Molecular beam allotaxy: A new approach to epitaxial heterostructures

Journal of Physics D: Applied Physics

Volumn 31, Issue 1, 1998, Pages 1-17

  Mantl, Siegfried ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COALESCENCE; MICROELECTRONICS; MOLECULAR BEAM EPITAXY; OPTOELECTRONIC DEVICES; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SINGLE CRYSTALS; SUBSTRATES; THERMAL EFFECTS;

MOLECULAR BEAM ALLOTAXY (MBA); OSTWALD RIPENING; SEMICONDUCTING SILICIDES;

HETEROJUNCTIONS;

EID: 0032491756     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/1/002     Document Type: Review

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