Vertical ordering of islands in Ge-Si multilayers

Applied Physics A: Materials Science and Processing

Volumn 62, Issue 6, 1996, Pages 575-579

  Rahmati, B ^a   Jaeger, W ^a   Trinkaus, H ^a   Loo, R ^a   Vescan, L ^a   Lueth, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; ELECTRONIC PROPERTIES; EPITAXIAL GROWTH; MATHEMATICAL MODELS; MULTILAYERS; RELAXATION PROCESSES; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ELASTIC INTERACTION; ISLAND FORMATION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; VERTICAL ORDERING;

SEMICONDUCTING GERMANIUM COMPOUNDS;

EID: 0030166498     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050344     Document Type: Article

References (15)