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Volumn 8, Issue 4, 1998, Pages 330-337

The effects of post-deposition processes on polysilicon Young's modulus

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; MICROELECTROMECHANICAL DEVICES; PHOSPHORUS; SEMICONDUCTING SILICON COMPOUNDS;

EID: 0032291865     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/8/4/012     Document Type: Article
Times cited : (29)

References (28)
  • 3
    • 1542755919 scopus 로고
    • Theoretical caœlculation for the Young's modulus of poly-Si and a-Si films
    • Pittsburgh, PA: Materials Research Society
    • Guo S, Zou D and Wang W 1992 Theoretical caœlculation for the Young's modulus of poly-Si and a-Si films Mater. Res. Soc. Symp. Proc. vol 276 (Pittsburgh, PA: Materials Research Society) pp 233-8
    • (1992) Mater. Res. Soc. Symp. Proc. , vol.276 , pp. 233-238
    • Guo, S.1    Zou, D.2    Wang, W.3
  • 7
    • 0024861337 scopus 로고    scopus 로고
    • A novel technique and structure for the measurement of intrinsic stress and Young's modulus of thin films
    • Najafi K and Suzuki K A novel technique and structure for the measurement of intrinsic stress and Young's modulus of thin films Proc. IEEE Micro Electro Mechanical Systems (1989) pp 96-7
    • Proc. IEEE Micro Electro Mechanical Systems (1989) , pp. 96-97
    • Najafi, K.1    Suzuki, K.2
  • 8
    • 0006116259 scopus 로고    scopus 로고
    • Electronic determination of the modulus of elasticity and intrinsic stress of thin films using capacitive bridges
    • Pittsburgh, PA: Materials Research Society
    • Wang S, Crary S and Najafi K Electronic determination of the modulus of elasticity and intrinsic stress of thin films using capacitive bridges Mater. Res. Soc. Symp. Proc. vol 276 (Pittsburgh, PA: Materials Research Society) pp 203-8
    • Mater. Res. Soc. Symp. Proc. , vol.276 , pp. 203-208
    • Wang, S.1    Crary, S.2    Najafi, K.3
  • 9
    • 0020738122 scopus 로고
    • Effect of phosphorus doping on stress in silicon and polycrystalline silicon
    • Muraka S P and Retajczyk T F Jr 1973 Effect of phosphorus doping on stress in silicon and polycrystalline silicon J. Appl. Phys. 54 2069-72
    • (1973) J. Appl. Phys. , vol.54 , pp. 2069-2072
    • Muraka, S.P.1    Retajczyk Jr., T.F.2
  • 19
    • 33749944166 scopus 로고
    • A simple technique for the determination of mechanical strain in thin films with applications to polysilicon
    • Guckel H, Randazzo T and Burns D W 1985 A simple technique for the determination of mechanical strain in thin films with applications to polysilicon J. Appl. Phys. 57 1671-5
    • (1985) J. Appl. Phys. , vol.57 , pp. 1671-1675
    • Guckel, H.1    Randazzo, T.2    Burns, D.W.3
  • 22
    • 0018997923 scopus 로고    scopus 로고
    • Structure and properties of LPCVD silicon films
    • Kamins T I Structure and properties of LPCVD silicon films J. Electrochem. Soc. 127 686-90
    • J. Electrochem. Soc. , vol.127 , pp. 686-690
    • Kamins, T.I.1
  • 25
    • 36849104521 scopus 로고
    • Calculated elastic constants for stress problems associated with semiconductor devices
    • Brantley WA 1973 Calculated elastic constants for stress problems associated with semiconductor devices J. Appl. Phys. 44 534-7
    • (1973) J. Appl. Phys. , vol.44 , pp. 534-537
    • Brantley, W.A.1
  • 26
    • 0020125387 scopus 로고
    • Determination of the primary elastic constants from thin foils having a strong texture
    • Baral D, Hilliard J E, Ketterson J B and Miyano K 1982 Determination of the primary elastic constants from thin foils having a strong texture J. Appl. Phys. 53 3552-9
    • (1982) J. Appl. Phys. , vol.53 , pp. 3552-3559
    • Baral, D.1    Hilliard, J.E.2    Ketterson, J.B.3    Miyano, K.4
  • 27
    • 0001299605 scopus 로고    scopus 로고
    • LPCVD polycrystalline silicon thin films: The evolution of structure, texture and stress
    • Pittsburgh, PA: Materials Research Society
    • Krulevitch P, Nguyen T D, Johnson G C, Howe R T, Wenk H R and Gronsky R LPCVD polycrystalline silicon thin films: the evolution of structure, texture and stress Mater. Res. Soc. Symp. Proc. vol 202 (Pittsburgh, PA: Materials Research Society) pp 167-72
    • Mater. Res. Soc. Symp. Proc. , vol.202 , pp. 167-172
    • Krulevitch, P.1    Nguyen, T.D.2    Johnson, G.C.3    Howe, R.T.4    Wenk, H.R.5    Gronsky, R.6
  • 28
    • 0002645964 scopus 로고    scopus 로고
    • Stress and microstructure in phosphorus doped polycrystalline silicon
    • Pittsburgh, PA: Materials Research Society
    • Krulevitch P, Johnson G C and Howe R T Stress and microstructure in phosphorus doped polycrystalline silicon Mater. Res. Soc. Symp. Proc. vol 276 (Pittsburgh, PA: Materials Research Society) pp 79-84
    • Mater. Res. Soc. Symp. Proc. , vol.276 , pp. 79-84
    • Krulevitch, P.1    Johnson, G.C.2    Howe, R.T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.