Elastic properties and microstructure of LPCVD polysilicon films

Journal of Micromechanics and Microengineering

Volumn 6, Issue 4, 1996, Pages 436-446

  Maier Schneider, D ^a   Koprululu A ^a   Ballhausen Holm, S ^a   Obermeier, E ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; ELASTICITY; ION IMPLANTATION; MICROELECTROMECHANICAL DEVICES; RESIDUAL STRESSES; SEMICONDUCTOR DOPING; TRANSMISSION ELECTRON MICROSCOPY;

DOPING CONCENTRATION; FILM THICKNESS; POLYSILICON FILMS;

THIN FILMS;

EID: 0030362039     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/4/011     Document Type: Article

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