Reactive ion etching of Pb(ZrxTi1-x)O3 thin films in an inductively coupled plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1894-1900

  Chung, Chee Won ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005018737     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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