Efficiency evaluation of postetch metal stack anticorrosion treatments using chemical analyses by x-ray photoelectron spectroscopy and wide dispersive x-ray fluorescence

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 1000-1007

  Czuprynski, P ^a   Joubert, O ^a   Heitzmann, M ^b   Louis, D ^b   Vizioz, C ^b   Lajoinie, E ^b  

^a ORANGE LABS   (France)

^b CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; CORROSION PROTECTION; PLASMA ETCHING; PLASMA SOURCES; X RAY PHOTOELECTRON SPECTROSCOPY;

ANTICORROSION TREATMENTS; WIDE DISPERSIVE X RAY FLUORESCENCE;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031190363     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589383     Document Type: Review

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