Possible application of micromachine technology for nanometer lithography

Microelectronics Journal

Volumn 29, Issue 9, 1998, Pages 601-611

  Wada, Y ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CMOS INTEGRATED CIRCUITS; ELECTRON BEAM LITHOGRAPHY; FABRICATION; MOSFET DEVICES; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SCANNING TUNNELING MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY LITHOGRAPHY;

MICROMACHINE TECHNOLOGY; PATTERN DELINEATION TOOL; SCANNING PROBE MICROSCOPE LITHOGRAPHY; VACUUM TUNNELING GAP;

MICROELECTRONIC PROCESSING;

EID: 0032166367     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2692(98)00023-8     Document Type: Article

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