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Volumn 1, Issue 1, 1998, Pages 65-73

Inductively coupled plasma etching of III-V semiconductors in Cl2-based chemistries

Author keywords

Compound semiconductors; Etching

Indexed keywords

COMPOSITION; MORPHOLOGY; PLASMAS; PRESSURE; SEMICONDUCTOR MATERIALS; SURFACES;

EID: 0032035859     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00002-X     Document Type: Article
Times cited : (15)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.