Etching of InP at ≳1 μm/min in Cl2/Ar plasma chemistries

Applied Physics Letters

Volumn 68, Issue 6, 1996, Pages 847-849

  Lee, J W ^a   Hong, J ^a   Pearton, S J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003271892     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116553     Document Type: Article

References (21)

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