Inductively coupled Ar plasma damage in AlGaAs

Journal of the Electrochemical Society

Volumn 144, Issue 9, 1997, Pages

  Lee, J W ^a   Hays, D ^a   Abernathy, C R ^a   Pearton, S J ^a   Hobson, W S ^b   Constantine, C ^c  

^a University of Florida   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c Plasma Therm IP   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CALCULATIONS; CARRIER CONCENTRATION; CURVE FITTING; DEFECTS; ELECTRON CYCLOTRON RESONANCE; ELECTRON TRANSPORT PROPERTIES; IONS; MATHEMATICAL MODELS; SEMICONDUCTING ALUMINUM COMPOUNDS;

INDUCTIVELY COUPLED PLASMAS; ION INDUCED DAMAGE;

PLASMAS;

EID: 0031233570     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837932     Document Type: Article

References (17)

1. J. Asmussen, J. Vac. Sci. Technol. A, 7, 889 (1989).
2. See, for example, High Density Plasma Sources, O. Popov, Editor, Noyes Publications, Park Ridge, NJ (1996).
3. R. J. Shul, M. L. Lovejoy, D. L. Hetherington, D. J. Rieger, J. F. Klem, and M. R. Melloch, J. Vac. Sci. Technol. B, 13, 27 (1995).
4. F. Ren, Mater. Res. Soc. Symp. Proc., 300, 13 (1993).
5. K. K. Ko and S. W. Pang, J. Vac. Sci. Technol. B, 13, 2376 (1995).
6. R. J. Shul, M. L. Lovejoy, A. G. Baca, J. C. Zolper, D. J. Rieger, M. J. Hafich, R. F. Corless, and C. B. Vartuli, J. Vac. Sci. Technol. A, 13, 912 (1995).
7. K. L. Seaward, Appl. Phys. Lett., 61, 3004 (1992).
8. S. J. Pearton, U. K. Chakrabarti, and W. S. Hobson, J. Appl. Phys., 66, 2061 (1989).
9. S. M. Collins, D. A. Brown, J. F. O'Hanlon, and R. N. Carlile, J. Vac. Sci. Technol. A, 14, 634 (1996).
10. M. A. Liebermann and A. J. Lichtenburg, Principles of Plasma Discharges and Materials Processing, Wiley-Interscience, New York (1994).
11. R. J. Shul, G. B. McClellan, S. A. Casalnuovo, D. J. Rieger, S. J. Pearton, C. Constantine, C. Barratt, R. F. Karlieck, C. Tran, and M. Schurmann, Appl. Phys. Lett., 69, 1119 (1996).
12. J. Etrillard, F. Heliot, P. Ossart, M. Juhel, G. Patriarche, P. Carrenac, C. Vieu, M. Puech, and P. Maguin, J. Vac. Sci. Technol. A, 14, 1056 (1993).
13. W. S. Hobson, Mater. Res. Soc. Symp. Proc., 300, 75 (1993).
14. C. R. Abernathy, Mater. Sci. Eng. Rep., 4, 313 (1995).
15. R. R. Stradtmann, J. W. Lee, C. R. Abernathy, S. J. Pearton, and W. S. Hobson, This Journal, 143, L219 (1996).
16. R. M. Olson, Jr., J. E. Kazior, B. Lane, W. M. Halber, and L. Bourget, ibid., 143, 233 (1996).
17. J. D. Woodhouse, J. P. Donnelly, and G. W. Iseler, Solid-State Electron., 31, 13 (1988).