Critical issues of III-V compound semiconductor processing

Materials Science and Engineering B

Volumn 44, Issue 1-3, 1997, Pages 1-7

  Pearton, S J ^a  

^a University of Florida   (United States)

Author keywords

Exothermal; Ion density; Wet etching

Indexed keywords

OHMIC CONTACTS; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

ION DENSITY; RECTIFYING CONTACTS; WET ETCHING;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0001931753     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01744-8     Document Type: Article

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