![]() |
Volumn 14, Issue 3, 1996, Pages 1056-1061
|
Sidewall and surface induced damage comparison between reactive ion etching and inductive plasma etching of InP using a CH4/H2/O2 gas mixture
|
Author keywords
[No Author keywords available]
|
Indexed keywords
|
EID: 5844379814
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.580133 Document Type: Review |
Times cited : (37)
|
References (6)
|