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Volumn 75, Issue 7, 1999, Pages 944-946

Reactive molecular-beam epitaxy of GaN layers directly on 6H-SiC(0001)

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001629816     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124562     Document Type: Article
Times cited : (41)

References (19)
  • 11
    • 0031170485 scopus 로고    scopus 로고
    • L. Zhou, V. Audurier, P. Pirouz, and J. A. Powell, J. Electrochem. Soc. 144, L161 (1997). In our case, the polishing removed the deep scratches visible on the as-received wafers and thus reduced the rms roughness from typically 20 to 5 Å. Furthermore, x-ray ω scans revealed a reduced mosaicity which is presumably due to a removal of the damage layer.
    • (1997) J. Electrochem. Soc. , vol.144
    • Zhou, L.1    Audurier, V.2    Pirouz, P.3    Powell, J.A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.