Future directions in electroplated materials for thin-film recording heads

IBM Journal of Research and Development

Volumn 42, Issue 5, 1998, Pages 671-680

  Andricacos, P C ^a,b,c   Robertson, N ^d,e,f,g,h  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM Thomas J Watson Research Center ^*  (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d IBM   (United States)

^e IBM ALMADEN RESEARCH CENTER   (United States)

^f IBM Almaden Research Center ^*  (United States)

^g UNIVERSITY OF CALIFORNIA   (United States)

^h ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; IRON ALLOYS; MAGNETIC HEADS; MAGNETIC MOMENTS; MAGNETIC THIN FILMS; MASKS;

THIN FILM RECORDING HEADS;

ELECTROPLATING;

EID: 0032162825     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.425.0671     Document Type: Article

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