At-wavelength interferometry for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2455-2461

  Tejnil, Edita ^a,b   Goldberg, Kenneth A ^a,c   Lee, SangHun ^a,b   Medecki, Hector ^a   Batson, Phillip J ^a   Denham, Paul E ^a   MacDowell, Alastair A ^a   Bokor, Jeffrey ^a,b   Attwood, David ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001731566     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589666     Document Type: Article

References (15)

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