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Volumn 72, Issue 5, 1998, Pages 578-580

Atomistic simulation of SiH interactions with silicon surfaces during deposition from silane containing plasmas

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0043218362     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120764     Document Type: Article
Times cited : (18)

References (11)
  • 2
    • 21544466210 scopus 로고
    • See, for example 219 for a collection of papers
    • See, for example, Mater. Res. Soc. Symp. Proc. 192,219,297 for a collection of papers 1990-1994.
    • (1990) Mater. Res. Soc. Symp. Proc. , vol.192-297


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.