Characterization of amorphous hydrogenated carbon nitride films prepared by plasma-enhanced chemical vapor deposition using a helical resonator discharge

Journal of Applied Physics

Volumn 82, Issue 2, 1997, Pages 658-665

  Kim, Joo Han ^a   Ahn, Dong Hoon ^a   Kim, Yong Hwan ^b   Baik, Hong Koo ^b  

^a LG Electronics Inc   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; OPTICAL PROPERTIES; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS HYDROGENATED CARBON NITRIDE FILMS; HELICAL RESONATOR DISCHARGE; OPTICAL BAND GAP; STRUCTURAL PROPERTIES; TRANSMISSION ULTRAVIOLET VISIBLE SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 0031189259     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365595     Document Type: Article

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