CNx thin films prepared by laser chemical vapor deposition

Materials Science and Engineering B

Volumn 46, Issue 1-3, 1997, Pages 89-91

  Falk, F ^a   Meinschien, J ^a   Mollekopf, G ^a   Schuster, K ^a   Stafast, H ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

Carbon nitrogen thin films; Chemical vapor deposition

Indexed keywords

AMORPHOUS FILMS; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC INSULATING MATERIALS; EXCIMER LASERS; FILM PREPARATION; HEAT RESISTANCE; HIGH TEMPERATURE EFFECTS; NITROGEN; SOLUBILITY; SURFACE ROUGHNESS; TRANSPARENCY;

MECHANICAL STABILITY;

THIN FILMS;

EID: 0003849014     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01938-1     Document Type: Article

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