Photoluminescence and absorption in multi-energy Ge implanted type III silica

Journal of Non-Crystalline Solids

Volumn 345-346, Issue , 2004, Pages 284-292

  Magruder, R H ^a   Weeks, R A ^b   Weller, R A ^c   Galyon, R ^a  

^a BELMONT UNIVERSITY   (United States)

^b VANDERBILT UNIVERSITY   (United States)

^c VANDERBILT UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DEFECTS; DIFFRACTION GRATINGS; ELECTRIC EXCITATION; EXCIMER LASERS; FIBER OPTICS; GERMANIUM; ION IMPLANTATION; LIGHT ABSORPTION; PHOTOLUMINESCENCE; RADIATION; SEMICONDUCTOR DOPING; WAVEGUIDES;

BAND INTENSITY; CORRELATION COEFFICIENTS; GAUSSIAN FUNCTIONS; OPTICAL BANDS;

SILICA;

EID: 9544254867     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.08.097     Document Type: Conference Paper

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