SCOPUS 정보 검색 플랫폼

Volumn 68, Issue 22, 1996, Pages 3084-3086

Ion implantation-induced strong photosensitivity in high-purity fused silica: Correlation of index changes with VUV color centers

(4) Verhaegen, M a Brebner, J L a Allard, L B a Albert, J b

a ÉCOLE POLYTECHNIQUE DE MONTRÉAL (Canada)

b Industry Canada (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; COLOR CENTERS; EXCIMER LASERS; ION IMPLANTATION; LASER BEAM EFFECTS; MATHEMATICAL TRANSFORMATIONS; PHOTOSENSITIVITY; REFRACTIVE INDEX; SILICON; ULTRAVIOLET RADIATION;

ABSORPTION BANDS; ARGON FLUORIDE LASERS; KRAMERS KRONIG ANALYSIS; OPTICAL BLEACHING;

FUSED SILICA;

EID: 0030146386 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.116430 Document Type: Article

Times cited : (29)

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