Oxygen related defect center formation in MeV energy boron implanted silica

Journal of Non-Crystalline Solids

Volumn 259, Issue 1-3, 1999, Pages 73-80

  Magruder III, R H ^a   Weeks, R A ^b   Weller, R A ^b   Zuhr, R A ^c   Hensley, D K ^c  

^a BELMONT UNIVERSITY   (United States)

^b VANDERBILT UNIVERSITY   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; BAND STRUCTURE; BORON; COMPOSITION EFFECTS; DEFECTS; FUNCTIONS; ION IMPLANTATION; LIGHT ABSORPTION; OXYGEN; PHOTONS; THERMAL EFFECTS;

GAUSSIAN FUNCTIONS;

SILICA;

EID: 0033340168     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00498-6     Document Type: Article

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