SCOPUS 정보 검색 플랫폼

Volumn 239, Issue 1-3, 1998, Pages 78-83

Formation and photosensitivity of defects in Se implanted silica

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; DOSIMETRY; ION IMPLANTATION; LIGHT ABSORPTION; PHOTOSENSITIVITY; SELENIUM; SILICA; ULTRAVIOLET RADIATION;

DEFECT FORMATION; OPTICAL BLEACHING;

CRYSTAL DEFECTS;

EID: 0032184320 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/s0022-3093(98)00722-4 Document Type: Article

Times cited : (7)

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