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Springer Series in Materials Science

Volumn 109, Issue , 2008, Pages 153-197

Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering

(3) Depla, Diederik a Mahieu, Stijn a De Gryse, Roger a

a GHENT UNIVERSITY (Belgium)

Author keywords

Discharge Voltage; Reactive Atom; Reactive Magnetron; Target Condition; Target Material

Indexed keywords

EID: 85072851005 PISSN: 0933033X EISSN: 21962812 Source Type: Book Series
DOI: 10.1007/978-3-540-76664-3_5 Document Type: Chapter

Times cited : (32)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.