메뉴 건너뛰기




Volumn 53, Issue 2, 2015, Pages 193-199

Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer-based positive-tone photoresist materials

Author keywords

diblock brush terpolymer; lithography; photoresists; ROMP; vertical alignment on substrate

Indexed keywords

ALIGNMENT; LITHOGRAPHY; POLYMER FILMS;

EID: 85027927046     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.27362     Document Type: Article
Times cited : (11)

References (36)
  • 4
    • 79955887078 scopus 로고    scopus 로고
    • J. W. Thackeray, Proc. SPIE 2011, 7972, 797204-01-797204-14.
    • (2011) Proc. SPIE , vol.7972 , pp. 79720401-79720414
    • Thackeray, J.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.