Positive ArF resist with 2EAdMA/GBLMA resin system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 510-517

  Uetani, Yasunori ^a   Fujishima, Hiroaki ^a   Araki, Kaoru ^a   Endo, Kazuhisa ^a   Takemoto, Ichiki ^a  

^a SUMITOMO CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CONTRAST MEDIA; DISSOLUTION; HYDROLYSIS; RESINS; SILICON; SYNTHESIS (CHEMICAL);

POSITIVE RESISTS;

PHOTORESISTS;

EID: 0032624344     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350233     Document Type: Conference Paper

References (9)