Tailored star block copolymer architecture for high performance chemically amplified resists

Advanced Materials

Volumn 24, Issue 44, 2012, Pages 5939-5944

  Wieberger, Florian ^a   Neuber, Christian ^a   Ober, Christopher K ^b   Schmidt, Hans Werner ^a  

^a UNIVERSITY OF BAYREUTH   (Germany)

^b Cornell University   (United States)

Author keywords

atom transfer radical polymerization; electron beam lithography; resist sensitivity; star block copolymers; tailored molecular architectures

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; MOLECULAR ARCHITECTURE; POLYDISPERSITY INDICES; RESIST MATERIALS; RESIST SENSITIVITY; STAR BLOCK COPOLYMER;

ARCHITECTURE; BLOCK COPOLYMERS; ELECTRON BEAM LITHOGRAPHY; POLYMERIZATION; STARS;

ATOM TRANSFER RADICAL POLYMERIZATION;

POLYMER;

ARTICLE; CHEMISTRY; MATERIALS TESTING; SOLUBILITY;

MATERIALS TESTING; POLYMERS; SOLUBILITY;

EID: 84869432609     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201201547     Document Type: Article

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