Bottom-up/top-down, high-resolution, high-throughput lithography using vertically assembled block bottle brush polymers

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 12, Issue 4, 2013, Pages

  Trefonas, Peter ^a   Thackeray, James W ^a   Sun, Guorong ^b   Cho, Sangho ^b   Clark, Corrie ^b   Verkhoturov, Stanislav V ^b   Eller, Michael J ^b   Li, Ang ^b   Pavia Sanders, Adriana ^b   Schweikert, Emile A ^b   Wooley, Karen L ^b  

^a Dow Electronic Materials   (United States)

^b TEXAS A AND M UNIVERSITY   (United States)

Author keywords

block copolymer.; directed selfassembly; electron beam lithography; extreme ultraviolet; lithography

Indexed keywords

BLOCK COPOLYMERS; BRUSHES; CHAINS; DENDRIMERS; ELECTRON BEAM LITHOGRAPHY; LITHOGRAPHY; MONOMERS; PHOTORESISTS;

BOTTLE-BRUSH POLYMERS; DIRECTED SELF-ASSEMBLY; EXTREME ULTRAVIOLET; NEGATIVE PHOTORESISTS; OPTICAL RADIATIONS; PHOTOACID GENERATORS; POLYMER ARCHITECTURE; SEQUENTIAL GRAFTING;

CYLINDERS (SHAPES);

EID: 84890684762     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.12.4.043006     Document Type: Article

References (12)

1. C. A. Mack, "LER: the ultimate limiter for resolution in production?," Proc. SPIE 8325, 832536 (2012).
2. C. A. Mack, "Line-edge roughness and the ultimate limits of lithography," Proc. SPIE 7639, 763931 (2010).
3. B. Rathsack et al., "Pattern scaling with directed self assembly through lithography and etch process integration," Proc. SPIE 8323, 83230B (2012).
4. C. Bencher et al., "Self-assembly patterning for sub-15 nm half-pitch: a transition from lab to fab," Proc. SPIE 7970, 79700F (2011).
5. R. Ruiz et al., "Density multiplication and improved lithography by directed block copolymer assembly," Science 321, 936-939 (2008).
6. M. Li and C. K. Ober, "Block copolymer patterns and templates," Mater. Today 9(9), 30-39 (2006). (Pubitemid 44224165)
7. R. Maeda et al., "Top down meets bottom up: block copolymers with reactive segments," J. Photopolym. Sci. Tech. 25(1), 17-20 (2012).
8. C. H. Chen et al., "Anisotropic wet etching of Chalcogenide glass resists," US Patent 4,454,221 (1984).
9. G. Sun et al., "Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent pre-assembled high resolution and high sensitivity negative-tone photoresist materials," J. Am. Chem. Soc. 135, 4203-4206 (2013).
10. Y. Xia et al., "Efficient synthesis of narrowly dispersed brush copolymers and study of their assemblies: the importance of side chain arrangement," J. Am. Chem. Soc. 131, 18525-18532 (2009).
11. M. Müller et al., "Water-soluble organo-silica hybrid nanotubes templated by cylindrical polymer brushes," J. Am. Chem. Soc. 132, 16587-16592 (2010).
12. Z. Li et al., "Dynamic cylindrical assembly of triblock copolymers by a hierarchical process of covalent and supramolecular interactions," J. Am. Chem. Soc. 133, 1228-1231 (2011).