Hyperbranched polymers for photolithographic applications - Towards understanding the relationship between chemical structure of polymer resin and lithographic performances

Advanced Materials

Volumn 21, Issue 10-11, 2009, Pages 1121-1125

  Chochos, Christos L ^a,e   Ismailova, Esma ^a   Brochon, Cyril ^a   Leclerc, Nicolas ^a   Tiron, Raluca ^b   Sourd, Claire ^b   Bandelier, Philippe ^b   Foucher, Johann ^b   Ridaoui, Hassan ^c   Dirani, Ali ^c   Soppera, Olivier ^c   Perret, Damien ^d   Brault, Christophe ^d   Serra, Christophe A ^a   Hadziioannou, Georges ^a  

^a UNIVERSITÉ DE STRASBOURG   (France)

^b CEA LETI   (France)

^c UNIVERSITÉ DE HAUTE ALSACE   (France)

^d CEA GRENOBLE   (France)

^e INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL STRUCTURES; CONTROLLED RADICAL POLYMERIZATIONS; HYPER-BRANCHED POLYMERS; PHOTO ACID GENERATORS; POLYMER RESINS; RESEARCH EFFORTS; RESIST PATTERNS; SEM;

ATOM TRANSFER RADICAL POLYMERIZATION; ATOMIC FORCE MICROSCOPY; MONOMERS; ORGANIC POLYMERS; PHOTORESISTS; POLYMERIZATION; POLYMERS; RESINS; SCANNING ELECTRON MICROSCOPY; STRUCTURE (COMPOSITION); THREE DIMENSIONAL;

DENDRIMERS;

EID: 65149105799     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200801715     Document Type: Article

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