Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer

ACS Nano

Volumn 10, Issue 3, 2016, Pages 3435-3442

  Jin, Hyeong Min ^a   Lee, Seung Hyun ^a   Kim, Ju Young ^a   Son, Seung Woo ^b   Kim, Bong Hoon ^a   Lee, Hwan Keon ^a   Mun, Jeong Ho ^a   Cha, Seung Keun ^a   Kim, Jun Soo ^a   Nealey, Paul F ^c   Lee, Keon Jae ^a   Kim, Sang Ouk ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hanyang University   (South Korea)

^c UNIVERSITY OF CHICAGO   (United States)

Author keywords

block copolymer; directed self assembly; graphene; laser; photothermal effect; self assembly

Indexed keywords

BLOCK COPOLYMERS; GRAPHENE; HIGH POWER LASERS; LASER MATERIALS PROCESSING; LASERS; MANUFACTURE; NANOTECHNOLOGY;

BLOCK COPOLYMER SELF-ASSEMBLY; CHEMICALLY-MODIFIED GRAPHENE; DIRECTED SELF-ASSEMBLY; DISORDER-ORDER TRANSITIONS; FUNDAMENTAL PRINCIPLES; NANO-FABRICATION METHODS; PHOTOTHERMAL EFFECTS; TWO-DIMENSIONAL MATERIALS;

SELF ASSEMBLY;

EID: 84961928103     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b07511     Document Type: Article

References (67)

1. Bates, F. S.; Fredrickson, G. H. Block Copolymer Thermodynamics: Theory and Experiment Annu. Rev. Phys. Chem. 1990, 41, 525-557 10.1146/annurev.pc.41.100190.002521
2. Whitesides, G. M.; Mathias, J. P.; Seto, C. T. Molecular Self-Assembly and Nanochemistry: A Chemical Strategy for the Synthesis of Nanostructures Science 1991, 254, 1312-1319 10.1126/science.1962191
3. 11 Holes in 1 Square Centimeter Science 1997, 276, 1401-1404 10.1126/science.276.5317.1401
4. Kim, S. O.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; De Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414 10.1038/nature01775
5. Onses, M. S.; Song, C.; Williamson, L.; Sutanto, E.; Ferreira, P. M.; Alleyne, A. G.; Nealey, P. F.; Ahn, H.; Rogers, J. A. Hierarchical Patterns of Three-Dimensional Block-Copolymer Films Formed by Electrohydrodynamic Jet Printing and Self-Assembly Nat. Nanotechnol. 2013, 8, 667-675 10.1038/nnano.2013.160
6. Segalman, R. A.; Yokoyama, H.; Kramer, E. J. Graphoepitaxy of Spherical Domain Block Copolymer Films Adv. Mater. 2001, 13, 1152-1155 10.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-5
7. Cheng, J. Y.; Mayes, A. M.; Ross, C. A. Nanostructure Engineering by Templated Self-Assembly of Block Copolymers Nat. Mater. 2004, 3, 823-828 10.1038/nmat1211
8. Stoykovich, M. P.; Muller, M.; Kim, S. O.; Solak, H. H.; Edwards, E. W.; de Pablo, J. J.; Nealey, P. F. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures Science 2005, 308, 1442-1446 10.1126/science.1111041
9. Bita, I.; Yang, J. K.; Jung, Y. S.; Ross, C. A.; Thomas, E. L.; Berggren, K. K. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates Science 2008, 321, 939-943 10.1126/science.1159352
10. Welander, A. M.; Kang, H. M.; Stuen, K. O.; Solak, H. H.; Muller, M.; de Pablo, J. J.; Nealey, P. F. Rapid Directed Assembly of Block Copolymer Films at Elevated Temperatures Macromolecules 2008, 41, 2759-2761 10.1021/ma800056s
11. Jo, A.; Joo, W.; Jin, W. H.; Nam, H.; Kim, J. K. Ultrahigh-Density Phase-Change Data Storage without the Use of Heating Nat. Nanotechnol. 2009, 4, 727-731 10.1038/nnano.2009.260
12. Felts, J. R.; Onses, M. S.; Rogers, J. A.; King, W. P. Nanometer Scale Alignment of Block-Copolymer Domains by Means of a Scanning Probe Tip Adv. Mater. 2014, 26, 2999-3002 10.1002/adma.201305481
13. Kim, S.; Nealey, P. F.; Bates, F. S. Directed Assembly of Lamellae Forming Block Copolymer Thin Films near the Order-Disorder Transition Nano Lett. 2014, 14, 148-152 10.1021/nl403628d
14. Kim, S. H.; Misner, M. J.; Xu, T.; Kimura, M.; Russell, T. P. Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation Adv. Mater. 2004, 16, 226-231 10.1002/adma.200304906
15. Tang, C.; Lennon, E. M.; Fredrickson, G. H.; Kramer, E. J.; Hawker, C. J. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays Science 2008, 322, 429-432 10.1126/science.1162950
16. Jung, Y. S.; Ross, C. A. Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns Adv. Mater. 2009, 21, 2540-2545 10.1002/adma.200802855
17. Park, S.; Lee, D. H.; Xu, J.; Kim, B.; Hong, S. W.; Jeong, U.; Xu, T.; Russell, T. P. Macroscopic 10-Terabit-Per-Square-Inch Arrays from Block Copolymers with Lateral Order Science 2009, 323, 1030-1033 10.1126/science.1168108
18. Ross, C. A.; Berggren, K. K.; Cheng, J. Y.; Jung, Y. S.; Chang, J. B. Three-Dimensional Nanofabrication by Block Copolymer Self-Assembly Adv. Mater. 2014, 26, 4386-4396 10.1002/adma.201400386
19. Kim, J. M.; Kim, Y. J.; Park, W. I.; Hur, Y. H.; Jeong, J. W.; Sim, D. M.; Baek, K. M.; Lee, J. H.; Kim, M. J.; Jung, Y. S. Eliminating the Trade-Off between the Throughput and Pattern Quality of Sub-15 nm Directed Self-Assembly via Warm Solvent Annealing Adv. Funct. Mater. 2015, 25, 306-315 10.1002/adfm.201401529
20. Bäuerle, D. W. Overview and Fundamentals. In Laser processing and chemistry; Springer: Heidelberg, 2013; pp 3-4.
21. Im, J. S.; Kim, H. J.; Thompson, M. O. Phase-Transformation Mechanisms Involved in Excimer-Laser Crystallization of Amorphous-Silicon Films Appl. Phys. Lett. 1993, 63, 1969-1971 10.1063/1.110617
22. 2 Appl. Phys. Lett. 1996, 69, 2864-2866 10.1063/1.117344
23. Arora, H.; Du, P.; Tan, K. W.; Hyun, J. K.; Grazul, J.; Xin, H. L.; Muller, D. A.; Thompson, M. O.; Wiesner, U. Block Copolymer Self-Assembly-Directed Single-Crystal Homo- and Heteroepitaxial Nanostructures Science 2010, 330, 214-219 10.1126/science.1193369
24. Tan, K. W.; Saba, S. A.; Arora, H.; Thompson, M. O.; Wiesner, U. Colloidal Self-Assembly-Directed Laser-Induced Non-Close-Packed Crystalline Silicon Nanostructure ACS Nano 2011, 5, 7960-7966 10.1021/nn2023446
25. Jung, B.; Ober, C. K.; Thompson, M. O.; Chandhok, M. LWR Reduction and Flow of Chemically Amplified Resist Patterns During Sub-Millisecond Heating Proc. SPIE 2011, 7972, 79722S 10.1117/12.881675
26. 2 Laser Heat Treatment Proc. SPIE 2010, 7639, 76390L-76390L-76399 10.1117/12.848418
27. Singer, J. P.; Kooi, S. E.; Thomas, E. L. Focused Laser Spike (Flask) Annealing of Photoactivated Chemically Amplified Resists for Rapid Hierarchical Patterning Nanoscale 2011, 3, 2730-2738 10.1039/c1nr10050e
28. Jung, B.; Satish, P.; Bunck, D. N.; Dichtel, W. R.; Ober, C. K.; Thompson, M. O. Laser-Induced Sub-Millisecond Heating Reveals Distinct Tertiary Ester Cleavage Reaction Pathways in a Photolithographic Resist Polymer ACS Nano 2014, 8, 5746-5756 10.1021/nn500549w
29. Singer, J. P.; Kooi, S. E.; Thomas, E. L. Focused Laser-Induced Marangoni Dewetting for Patterning Polymer Thin Films J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 225-236 10.1002/polb.23906
30. Singer, J. P.; Lin, P. T.; Kooi, S. E.; Kimerling, L. C.; Michel, J.; Thomas, E. L. Direct-Write Thermocapillary Dewetting of Polymer Thin Films by a Laser-Induced Thermal Gradient Adv. Mater. 2013, 25, 6100-6105 10.1002/adma.201302777
31. Jacobs, A. G.; Liedel, C.; Ober, C. K.; Thompson, M. O. Understanding of PS-b-PMMA Phase Segregation under Laser-Induced Millisecond Thermal Annealing Proc. SPIE 2015, 9423, 942309 10.1117/12.2086057
32. Jacobs, A. G.; Jung, B.; Ober, C. K.; Thompson, M. O. Control of PS-b-PMMA Directed Self-Assembly Registration by Laser Induced Millisecond Thermal Annealing Proc. SPIE 2014, 9049, 90492B 10.1117/12.2046513
33. Singer, J. P.; Gotrik, K. W.; Lee, J. H.; Kooi, S. E.; Ross, C. A.; Thomas, E. L. Alignment and Reordering of a Block Copolymer by Solvent-Enhanced Thermal Laser Direct Write Polymer 2014, 55, 1875-1882 10.1016/j.polymer.2014.02.028
34. Majewski, P. W.; Rahman, A.; Black, C. T.; Yager, K. G. Arbitrary Lattice Symmetries via Block Copolymer Nanomeshes Nat. Commun. 2015, 6, 7448 10.1038/ncomms8448
35. Majewski, P. W.; Yager, K. G. Block Copolymer Response to Photothermal Stress Fields Macromolecules 2015, 48, 4591-4598 10.1021/acs.macromol.5b00955
36. Majewski, P. W.; Yager, K. G. Latent Alignment in Pathway-Dependent Ordering of Block Copolymer Thin Films Nano Lett. 2015, 15, 5221-5228 10.1021/acs.nanolett.5b01463
37. Majewski, P. W.; Yager, K. G. Millisecond Ordering of Block Copolymer Films via Photothermal Gradients ACS Nano 2015, 9, 3896-3906 10.1021/nn5071827
38. Tan, K. W.; Jung, B.; Werner, J. G.; Rhoades, E. R.; Thompson, M. O.; Wiesner, U. Transient Laser Heating Induced Hierarchical Porous Structures from Block Copolymer-Directed Self-Assembly Science 2015, 349, 54-58 10.1126/science.aab0492
39. Srinivasan, R. Ablation of Polymers and Biological Tissue by Ultraviolet Lasers Science 1986, 234, 559-565 10.1126/science.3764428
40. Nair, R. R.; Blake, P.; Grigorenko, A. N.; Novoselov, K. S.; Booth, T. J.; Stauber, T.; Peres, N. M.; Geim, A. K. Fine Structure Constant Defines Visual Transparency of Graphene Science 2008, 320, 1308 10.1126/science.1156965
41. Eda, G.; Fanchini, G.; Chhowalla, M. Large-Area Ultrathin Films of Reduced Graphene Oxide as a Transparent and Flexible Electronic Material Nat. Nanotechnol. 2008, 3, 270-274 10.1038/nnano.2008.83
42. Lee, C.; Wei, X.; Kysar, J. W.; Hone, J. Measurement of the Elastic Properties and Intrinsic Strength of Monolayer Graphene Science 2008, 321, 385-388 10.1126/science.1157996
43. Geim, A. K. Graphene: Status and Prospects Science 2009, 324, 1530-1534 10.1126/science.1158877
44. Kim, K. S.; Zhao, Y.; Jang, H.; Lee, S. Y.; Kim, J. M.; Kim, K. S.; Ahn, J. H.; Kim, P.; Choi, J. Y.; Hong, B. H. Large-Scale Pattern Growth of Graphene Films for Stretchable Transparent Electrodes Nature 2009, 457, 706-710 10.1038/nature07719
45. Park, S.; Ruoff, R. S. Chemical Methods for the Production of Graphenes Nat. Nanotechnol. 2009, 4, 217-224 10.1038/nnano.2009.58
46. Kim, B. H.; Kim, J. Y.; Jeong, S. J.; Hwang, J. O.; Lee, D. H.; Shin, D. O.; Choi, S. Y.; Kim, S. O. Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography ACS Nano 2010, 4, 5464-5470 10.1021/nn101491g
47. Kim, J. Y.; Kim, B. H.; Hwang, J. O.; Jeong, S. J.; Shin, D. O.; Mun, J. H.; Choi, Y. J.; Jin, H. M.; Kim, S. O. Flexible and Transferrable Self-Assembled Nanopatterning on Chemically Modified Graphene Adv. Mater. 2013, 25, 1331-1335 10.1002/adma.201204131
48. Kim, B. H.; Park, S. J.; Jin, H. M.; Kim, J. Y.; Son, S. W.; Kim, M. H.; Koo, C. M.; Shin, J.; Kim, J. U.; Kim, S. O. Anomalous Rapid Defect Annihilation in Self-Assembled Nanopatterns by Defect Melting Nano Lett. 2015, 15, 1190-1196 10.1021/nl5042935
49. Bray, A. J. Theory of Phase-Ordering Kinetics Adv. Phys. 1994, 43, 357-459 10.1080/00018739400101505
50. Harrison, C.; Adamson, D. H.; Cheng, Z.; Sebastian, J. M.; Sethuraman, S.; Huse, D. A.; Register, R. A.; Chaikin, P. M. Mechanisms of Ordering in Striped Patterns Science 2000, 290, 1558-1560 10.1126/science.290.5496.1558
51. Boyer, D.; Vinals, J. Domain Coarsening of Stripe Patterns Close to Onset Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. 2001, 64, 050101 10.1103/PhysRevE.64.050101
52. Ruiz, R.; Bosworth, J. K.; Black, C. T. Effect of Structural Anisotropy on the Coarsening Kinetics of Diblock Copolymer Striped Patterns Phys. Rev. B: Condens. Matter Mater. Phys. 2008, 77, 054204 10.1103/PhysRevB.77.054204
53. Qian, H.; Mazenko, G. F. Growth of Order in an Anisotropic Swift-Hohenberg Model Phys. Rev. E 2006, 73, 036117 10.1103/PhysRevE.73.036117
54. Berry, B. C.; Bosse, A. W.; Douglas, J. F.; Jones, R. L.; Karim, A. Orientational Order in Block Copolymer Films Zone Annealed below the Order-Disorder Transition Temperature Nano Lett. 2007, 7, 2789-2794 10.1021/nl071354s
55. Leibler, L. Theory of Microphase Separation in Block Copolymers Macromolecules 1980, 13, 1602-1617 10.1021/ma60078a047
56. Fredrickson, G. H.; Helfand, E. Fluctuation Effects in the Theory of Microphase Separation in Block Copolymers J. Chem. Phys. 1987, 87, 697-705 10.1063/1.453566
57. De Rosa, C.; Park, C.; Thomas, E. L.; Lotz, B. Microdomain Patterns from Directional Eutectic Solidification and Epitaxy Nature 2000, 405, 433-437 10.1038/35013018
58. Park, C.; De Rosa, C.; Thomas, E. L. Large Area Orientation of Block Copolymer Microdomains in Thin Films via Directional Crystallization of a Solvent Macromolecules 2001, 34, 2602-2606 10.1021/ma0018603
59. Angelescu, D. E.; Waller, J. H.; Adamson, D. H.; Register, R. A.; Chaikin, P. M. Enhanced Order of Block Copolymer Cylinders in Single-Layer Films Using a Sweeping Solidification Front Adv. Mater. 2007, 19, 2687-2690 10.1002/adma.200602904
60. Zhang, H. D.; Zhang, J. W.; Yang, Y. L.; Zhou, X. D. Microphase Separation of Diblock Copolymer Induced by Directional Quenching J. Chem. Phys. 1997, 106, 784-792 10.1063/1.473165
61. Morkved, T. L.; Lu, M.; Urbas, A. M.; Ehrichs, E. E.; Jaeger, H. M.; Mansky, P.; Russell, T. P. Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields Science 1996, 273, 931-933 10.1126/science.273.5277.931
62. Angelescu, D. E.; Waller, J. H.; Adamson, D. H.; Deshpande, P.; Chou, S. Y.; Register, R. A.; Chaikin, P. M. Macroscopic Orientation of Block Copolymer Cylinders in Single-Layer Films by Shearing Adv. Mater. 2004, 16, 1736-1740 10.1002/adma.200400643
63. Hawker, C. J.; Barclay, G. G.; Orellana, A.; Dao, J.; Devonport, W. Initiating Systems for Nitroxide-Mediated "Living" Free Radical Polymerizations: Synthesis and Evaluation Macromolecules 1996, 29, 5245-5254 10.1021/ma951905d
64. Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. J. Controlling Polymer-Surface Interactions with Random Copolymer Brushes Science 1997, 275, 1458-1460 10.1126/science.275.5305.1458
65. Hummers, W. S.; Offeman, R. E. Preparation of Graphitic Oxide J. Am. Chem. Soc. 1958, 80, 1339-1339 10.1021/ja01539a017
66. Kim, J. E.; Han, T. H.; Lee, S. H.; Kim, J. Y.; Ahn, C. W.; Yun, J. M.; Kim, S. O. Graphene Oxide Liquid Crystals Angew. Chem., Int. Ed. 2011, 50, 3043-3047 10.1002/anie.201004692
67. Hwang, J. O.; Lee, D. H.; Kim, J. Y.; Han, T. H.; Kim, B. H.; Park, M.; No, K.; Kim, S. O. Vertical ZnO Nanowires/Graphene Hybrids for Transparent and Flexible Field Emission J. Mater. Chem. 2011, 21, 3432 10.1039/C0JM01495H