LWR reduction and flow of chemically amplified resist patterns during sub-millisecond heating

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Jung, Byungki ^a   Ober, Christopher K ^a   Thompson, Michael O ^a   Chandhok, Manish ^b  

^a School of Operations Research and Industrial Engineering   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Chemically amplified resist; Hardbake; Laser spike annealing; Line width roughness; Resist flow; Roughness

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; HARDBAKE; LINE WIDTH ROUGHNESS; RESIST FLOW; ROUGHNESS;

GLASS TRANSITION; PHOTORESISTS; SURFACE CHEMISTRY; SURFACE ROUGHNESS; SWELLING;

ROUGHNESS MEASUREMENT;

EID: 79955887366     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881675     Document Type: Conference Paper

References (7)

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