Technology for LPP sources

EUV Sources for Lithography

Volumn , Issue , 2006, Pages 537-561

  Stamm, Uwe ^a   Gäbel, Kai ^a  

^a XTREME Technologies   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LPP SOURCES;

EID: 84960285526     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1117/3.613774.Ch19     Document Type: Chapter

References (30)

1. Y. Watanabe, K. Ota, and H. Franken, "Joint requirements, " EUV Source Workshop, February 22, 2004; K. Ota, Y. Watanabe, H. Franken, and V. Banine, "Joint requirements, " 3rd International EUVL Symposium, Miyazaki, Japan (November 2004). Proceedings available at www.sematech.org.
2. W. Silfvast, M. Richardson, H. Bender, et al., "Laser-produced plasmas for soft x-ray projection lithography, " J. Vac. Sci. Technol. B 10(6), 3126-3133 (1992).
3. O. R. Wood II, W. Silvfast, J. Macklin, and P. Maloney, "Comparison of extreme-ultraviolet flux from 1.06-and 10.6-μm laser-produced plasma sources for pumping photoionization lasers, " Opt. Lett. 11, 198-200 (1986).
4. G. Schriever, K. Bergmann, and R. Lebert, "Narrowband laser produced extreme ultraviolet sources adapted to silicon/molybdenum multilayer optics, " J. Appl. Phys. 83, 4566-4571 (1998).
5. B. Abel, J. Aßmann, M. Faubel, et al., "Characterization of extreme ultraviolet light-emitting plasmas from a laser-excited fluorine containing liquid polymer jet target, " J. Appl. Phys. 95, 7619-7623 (2004).
6. F. Jin, K. Gäbel, M. Richardson, M. Kado, A. Vasil'ev, and D. Salzmann, "Mass-limited laser plasma cryogenic target for 13 nm point x-ray sources for lithography, " Proc. SPIE 2015, 151-159 (1994).
7. S. Düsterer, H. Schwoerer, W. Ziegler, C. Ziener, and R. Sauerbrey, "Optimization of EUV radiation yield from laser-produced plasma, " Appl. Phys. B 73, 693-698 (2001).
8. R. Spitzer, T. Orzechowski, D. Phillion, R. Kauffman, and C. Cerjan, "Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime, " J. Appl. Phys. 79, 2251-2258 (1996).
9. P. Dunne, D. O'Reilly, and G. O'Sullivan, "Prepulse-enhanced narrow bandwidth soft x-ray emission from a low debris, subnanosecond, laser plasma source, " Appl. Phys. Lett. 76, 34-36 (2000).
10. G. Kubiak, K. Krenz, K. Berger, T. Trucano, P. Fisher, and M. Gouge, "Cryogenic pallet laser plasma source targets, " OSA Proc. on Soft X-Ray Projection Lithography 23, 248-254 (1994).
11. N. Bwering, M. Martins, W. Partlo, and I. Formenkov, "Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations, " J. Appl. Phys. 95, 16-23 (2004).
12. P. Jansson, B. Hansson, O. Hemberg, et al., "Liquid-tin-jet laser-plasma extreme ultraviolet generation, " Appl. Phys. Lett. 84, 2256-2258 (2004).
13. C. Koay, C. Keyser, K. Takenoshita, et al., "High-conversion-efficiency tin material laser-plasma source for EUVL, " Proc. SPIE 5037, 801-806 (2003).
14. T. Tomie, "Progress of tin-plasma technology at AIST, " 2nd International EUVL Symposium, Antwerp, Belgium (September 2003). Proceedings available at www.sematech.org.
15. T. Trucano, D. Grady, R. Olson, and A. Farnsworth, "Computational analysis of debris formation in SXPL laser-plasma sources, " OSA Proc. on Soft X-Ray Projection Lithography 18, 146-150 (1993).
16. I. Turcu, R. Forber, R. Grygier, et al., "High-power x-ray point source for nextgeneration lithography, " Proc. SPIE 3767, 21-32 (1999).
17. M. Richardson, K. Gäbel, F. Jin, and W. Silfvast, "Cryogenic targets for laserplasma x-ray lithography sources, " OSA Proc. on Soft X-Ray Projection Lithography 18, 156-162 (1993).
18. E. Noda, S. Suzuki, and O. Morimiya, "Droplet Target Delivery Method for High Pulse-Rate Laser-Plasma Extreme Ultraviolet Light Source, " U.S. Patent No. 4, 723, 262 (1988).
19. L. Rayleigh, "On the capillary phenomena of jets, " Proc. Roy. Soc. London 29, 71-97 (1879).
20. B. A. M. Hansson, L. Rymell, M. Berglung, and H. Hertz, "A liquid-xenon-jet laser-plasma x-ray and euv source, " Microelectron. Eng. 53, 667-670 (2000).
21. H. Fiedorowicz, A. Bartnik, Z. Patron, and P. Parys, "X-ray emission from laser-irradiated gas puff targets, " Appl. Phys. Lett. 62, 2778-2780 (1993).
22. G. Kubiak and L. Bernardez, "Supersonic cluster jet source for debris-free extreme ultraviolet production, " Sandia National Labs., Report SAND97-8286, UC-411 (1997).
23. M. Segers, M. Bougeard, E. Caprin, et al., "Development of a laser-produced plasma source at 13.5 nm for the French extreme ultraviolet lithography test bench, " Microelectron. Eng. 61, 139-144 (2002).
24. M. Masnavi, M. Nakajima, E. Hotta, and K. Horioka, "Influence of nonequilibrium ionization process on efficiency of discharge pumped EUV Xe source, " poster presented at EUV SourceWorkshop, Antwerp, Belgium (September 29, 2003).
25. D. Basting and U. Stamm, "The development of eximer laser technology - history and future prospects, " Zeitschrift für Physikalische Chemie 215(12), 1575-1599 (2001).
26. B. Fay, "Modular laser produced plasma source for EUV lithography, " EUV Source Workshop, Santa Clara, CA (February 2003). Proceedings available at www.sematech.org.
27. U. Stamm, J. Brudermann, K. Gäbel, J. Kleinschmidt, and G. Schriever, "Gas discharge and laser produced plasma sources for EUV-lithography, " EUV Source Workshop, Dallas, TX (October 2002). Proceedings available at www.sematech.org.
28. L. Hackel, J. Miller, and C. Dane, "Phase conjugation in a high power regenerative laser amplifier system, " Int. J. Nonlinear Opt. Phys. 2, 171-185 (1993).
29. C. Stewen, K. Contag, M. Larionov, A. Giesen, and H. Hügel, "A 1-kW CW thin disc laser, " IEEE J. Sel. Topics in Quan. Elec. 6, 650-657 (2000).
30. U. Stamm, J. Kleinschmidt, K. Gäbel, et al., "EUV source power and lifetime: the most critical issues for EUV lithography, " Proc. SPIE 5374, 133-144 (2004).