Characterization of extreme ultraviolet light-emitting plasmas from a laser-excited fluorine containing liquid polymer jet target

Journal of Applied Physics

Volumn 95, Issue 12, 2004, Pages 7619-7623

  Abel, B ^a,b   Assmann, J ^a,b   Faubel, M ^c   Gabel K ^d   Kranzusch, S ^e   Lugovoj, E ^a,b   Mann, K ^e   Missalla, T ^f   Peth, Ch ^e  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b MAX PLANCK INSTITUTE FOR BIOPHYSICAL CHEMISTRY   (Germany)

^c MAX PLANCK INSTITUTE FOR DYNAMICS AND SELF ORGANIZATION   (Germany)

^d XTREME Technologies   (Germany)

^e LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^f Jenoptik Mikrotechnik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; ENERGY CONVERSION; ENERGY EFFICIENCY; FLUORINE; FUNCTIONS; INTEGRATION; JETS; LASER BEAMS; LIGHT EMISSION; LITHOGRAPHY; NOZZLES; POLYETHERS; PYROELECTRICITY; SPECTROSCOPIC ANALYSIS; ULTRAVIOLET RADIATION;

LIGHT-EMITTING PLASMAS; LIQUID POLYMER JETS; MICROJETS; SPATIAL PROFILES;

PLASMAS;

EID: 3142599614     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1737051     Document Type: Article

References (20)

1. M. Faubel, S. Schlemmer, and J. P. Toennies, Z. Phys. D: At., Mol. Clusters 10, 269 (1988).
2. M. Faubel and T. Kisters, Nature (London) 339, 527 (1989).
3. U. Vogt, H. Stiel, I. Will, M. Wieland, T. Wilhein, P. V. Nickles, and W. Sandner, Proc. SPIE 4343, 535 (2001).
4. B. A. M. Hanson, M. Berglund, O. Hemberg, and H. M. Hertz, Proc. SPIE 3997, 729 (2000).
5. X-ray Microscopy and Spectromicroscopy, edited by J. Thieme, G. Schmahl, D. Rudolph, and E. Umbach (Springer, Berlin, Heidelberg, 1998), ISBN: 3-540-63998-5.
6. U. Stamm et al., CD of Ist International Symposium on Extreme Ultraviolet Lithography, Dallas, TX, 14-17 October, 2002.
7. A. Shimoura, S. Amano, S. Miyamoto, and T. Mochizuki, Appl. Phys. Lett. 72, 164 (1998).
8. M. Berglund, L. Rymell, and H. Hertz, Appl. Phys. Lett. 69, 1683 (1996).
9. H. Fiedorowicz, A. Bartnik, H. Daido, I. W. Choi, M. Suzuki, and H. Yamagami, Opt. Commun. 184, 161 (2000).
10. M. Kanouff, H. Shields, L. Bernadez, and G. Kubiak, Proc. SPIE 4343, 507 (2001).
11. S. Kranzusch and K. Mann, Opt. Commun. 200, 223 (2001).
12. S. Kranzusch, C. Peth, and K. Mann, Rev. Sci. Instrum. 74, 969 (2003).
13. L. Rymell and H. M. Hertz, Opt. Commun. 103, 105 (1993).
14. L. Rymell, L. Malmqvist, M. Berglund, and H. M. Hertz, Microelectron, Eng. 466, 453 (1999).
15. S. Düsterer, H. Schwoerer, W. Ziegler, C. Ziener, and R. Sauerbrey, Appl. Phys. B: Lasers Opt. 73, 693 (2001).
16. U. Stamm, H. Schwoerer, and R. Lebert, Physik Journal 12, 33 (2002).
17. L. Laurenson, Vac. Techn. 28, 61 (1977).
18. L. Malmquist, L. Rymell, and H. M. Hertz, Appl. Phys. Lett. 68, 2627 (1996).
19. M. Faubel, in Photoionization and Photodetachment, edited by C. Y. Ng (World Scientific, Singapore, 2000), p. 634.
20. S. Vogt, G. Schneider, A. Steuernagel, J. Lucchesi, E. Schulze, D. Rudolf, and G. Schmahl, J. Struct. Biol. 132, 123 (2000).