Formation of nano-structured thin silicon layers by hydrogen plasma treatment of monocrystalline silicon

Proceedings of the IEEE Conference on Nanotechnology

Volumn 2001-January, Issue , 2001, Pages 282-287

  Fahrner, W R ^a   Job, R ^a   Ulyashin, A ^a  

^a UNIVERSITY OF HAGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON LASERS; MOLECULES; NANOCLUSTERS; NANOSTRUCTURES; NANOTECHNOLOGY; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SILICON; SUBSTRATES;

DEPOSITION PROCESS; HYDROGEN MOLECULE; HYDROGEN PLASMA TREATMENTS; HYDROGEN PLASMAS; LASER-ASSISTED PROCESS; NANO-STRUCTURED LAYER; THIN SILICON LAYERS; VISIBLE SPECTRAL RANGE;

MONOCRYSTALLINE SILICON;

EID: 84949200692     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2001.966434     Document Type: Conference Paper

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