Suppressing graphene nucleation during CVD on polycrystalline Cu by controlling the carbon content of the support foils

Carbon

Volumn 96, Issue , 2016, Pages 153-165

  Kraus, Jürgen ^a   Böbel, Magdalene ^a   Günther, Sebastian ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Chemical vapor deposition; Copper; Graphene; Microscopy; Nucleation and growth; Segregation; Surface chemistry

Indexed keywords

COPPER; DEPOSITION; GRAPHENE; METAL CLADDING; MICROSCOPIC EXAMINATION; MONOLAYERS; NUCLEATION; SEGREGATION (METALLOGRAPHY); SURFACE CHEMISTRY; SURFACE SEGREGATION; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON REMOVAL; CHEMICAL VAPOR DEPOSITIONS (CVD); DISSOLVED CARBONS; HYDROGEN PRETREATMENT; NUCLEATION AND GROWTH; OXYGEN PARTIAL PRESSURE; POLYCRYSTALLINE; RAPID COOLING PROCESS;

CHEMICAL VAPOR DEPOSITION;

EID: 84947968776     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2015.09.048     Document Type: Article

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