No graphene etching in purified hydrogen

Journal of Physical Chemistry Letters

Volumn 4, Issue 7, 2013, Pages 1100-1103

  Choubak, Saman ^a   Biron, Maxime ^a   Levesque, Pierre L ^b   Martel, Richard ^b   Desjardins, Patrick ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

carbon removal; copper; CVD growth; methane; oxidizing impurities; oxygen

Indexed keywords

CARBON REMOVAL; CHEMICAL VAPOR; COPPER SUBSTRATES; CVD GROWTHS; ETCHING REACTION; GRAPHENE FILMS; SYSTEMATIC STUDY; ULTRAHIGH PURITY;

CHEMICAL VAPOR DEPOSITION; COPPER; ETCHING; HYDROGEN; METHANE; OXYGEN; PURIFICATION; REMOVAL;

GRAPHENE;

EID: 84875767608     PISSN: None     EISSN: 19487185     Source Type: Journal    
DOI: 10.1021/jz400400u     Document Type: Article

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