Multiscale modeling and operation of PECVD of thin film solar cells

Chemical Engineering Science

Volumn 136, Issue , 2015, Pages 50-61

  Crose, Marquis ^a   Sang Il Kwon, Joseph ^a   Nayhouse, Michael ^a   Ni, Dong ^c   Christofides, Panagiotis D ^a,b  

^a Engineering IV   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c INSTITUTE OF AUTOMATION   (China)

Author keywords

Plasma enhanced chemical vapor deposition; Process modeling; Process optimization; Thin film solar cells; Thin film surface morphology; Thin film thickness

Indexed keywords

CALIBRATION; CHEMICAL REACTIONS; DEPOSITION; DIFFERENTIAL EQUATIONS; FILM THICKNESS; GASES; LIGHT; MICROSTRUCTURE; MORPHOLOGY; OPTIMIZATION; PHASE INTERFACES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON SOLAR CELLS; SILICON WAFERS; SUBSTRATES; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS; TRANSPORT PROPERTIES; VAPOR DEPOSITION;

COMPUTATIONAL REQUIREMENTS; HEIGHT-HEIGHT CORRELATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); PROCESS MODELING; THIN FILM SOLAR CELLS; THIN FILM SURFACE MICROSTRUCTURE; THIN FILM SURFACES; THIN-FILM SILICON SOLAR CELLS;

FILM GROWTH;

EID: 84946474475     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2015.02.027     Document Type: Article

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