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Volumn 1, Issue , 2003, Pages 883-886
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90 MHz nanomechanical structures fabricated by stencil deposition and dry etching
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Author keywords
Atomic force microscopy; Dry etching; Fabrication; Lithography; Nanoelectromechanical systems; Nanoscale devices; Nanostructures; Resonance; Resonant frequency; Silicon compounds
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Indexed keywords
ACTUATORS;
ATOMIC FORCE MICROSCOPY;
DEPOSITION;
FABRICATION;
LITHOGRAPHY;
MICROSYSTEMS;
NANOSTRUCTURES;
NATURAL FREQUENCIES;
NEMS;
RESONANCE;
SHOTCRETING;
SILICON COMPOUNDS;
SOLID-STATE SENSORS;
TRANSDUCERS;
HIGH RESONANCE FREQUENCY;
LOCAL DEPOSITION;
NANOMECHANICAL;
NANOMECHANICAL STRUCTURE;
NANOSCALE DEVICE;
RESONANCE FREQUENCIES;
RESONATING ELEMENTS;
SIMPLE METHOD;
DRY ETCHING;
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EID: 84944720068
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/SENSOR.2003.1215616 Document Type: Conference Paper |
Times cited : (1)
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References (12)
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