Microstructure of mixed oxide thin films prepared by magnetron sputtering at oblique angles

Thin Solid Films

Volumn 591, Issue , 2015, Pages 330-335

  Gil Rostra, J ^a   Garcia Garcia F J ^a   Ferrer, F J ^a   Gonzalez Elipe A R ^a   Yubero, F ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

Electrochromic films; Glancing angle deposition; Mixed oxides; Oblique angle deposition; Porous thin films; Reactive magnetron sputtering

Indexed keywords

FILM PREPARATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; NICKEL COMPOUNDS; OXIDE FILMS; SILICON; SILICON COMPOUNDS; STOICHIOMETRY; VAPOR DEPOSITION;

ELECTROCHROMIC FILMS; GLANCING ANGLE DEPOSITION; MIXED OXIDE; OBLIQUE-ANGLE DEPOSITION; POROUS THIN FILMS; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 84942832421     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2015.01.058     Document Type: Conference Paper

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