Colored semi-transparent Cu-Si oxide thin films prepared by magnetron sputtering

Optical Materials Express

Volumn 1, Issue 6, 2011, Pages 1100-1112

  Gil Rosta, J ^a   Yubero, F ^a   Fernandez R ^d   Vilajoana, T ^b   Artus P ^b   Dursteler J C ^b   Cotrino, J ^a   Ortega, I ^c   Gonzalez Elipe A R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b INDO (Av Alcalde Barnils)   (Spain)

^c CENTRO NACIONAL DE ACELERADORES   (Spain)

^d DEPARTMENT OF PHYSICAL METALLURGY   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; FILM CHARACTERISTICS; FILM STOICHIOMETRY; OPTICAL RESPONSE; OXIDE THIN FILMS; PROCESS PARAMETERS; REACTIVE MAGNETRON SPUTTERING; REACTIVE PLASMAS; SEMI-TRANSPARENT; ABSORPTION CO-EFFICIENT;

COPPER; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SILICON; STOICHIOMETRY; THIN FILMS; COPPER OXIDES; OXIDE FILMS; SILICON COMPOUNDS;

FILM PREPARATION;

EID: 84857379529     PISSN: None     EISSN: 21593930     Source Type: Journal    
DOI: 10.1364/OME.1.001100     Document Type: Article

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