Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

Applied Optics

Volumn , Issue 4, 2014, Pages A186-A196

  Gallais, Laurent ^a   Commandré, Mireille ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; BARIUM COMPOUNDS; CALCIUM FLUORIDE; COMPOSITE FILMS; DEPOSITION; DIELECTRIC MATERIALS; FLUORINE COMPOUNDS; FLUORSPAR; HAFNIUM OXIDES; II-VI SEMICONDUCTORS; LASER DAMAGE; LITHIUM COMPOUNDS; MAGNESIUM COMPOUNDS; MATERIALS HANDLING EQUIPMENT; NIOBIUM OXIDE; OXIDE FILMS; POTASSIUM COMPOUNDS; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR LASERS; SILICA; SILICON; SODIUM CHLORIDE; TANTALUM OXIDES; THIN FILMS; WIDE BAND GAP SEMICONDUCTORS; ZINC SELENIDE; ZINC SULFIDE; ZIRCONIA;

BULK MATERIALS; CODEPOSITION PROCESS; DEPOSITION TECHNIQUE; IONIC CRYSTALS; LASER DAMAGE THRESHOLD; LASER INDUCED DAMAGE THRESHOLDS; OPTICAL THIN FILMS; SINGLE-PULSE IRRADIATION;

OPTICAL FILMS;

EID: 84942367755     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.53.00A186     Document Type: Conference Paper

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