Mixed films of TiO2–SiO2 deposited by double electron–beam coevaporation

Applied Optics

Volumn 35, Issue 1, 1996, Pages 90-96

  Chen, Jyh Shin ^a,b   Chao, Shiuh ^a   Kao, Jiann Shiun ^b   Niu, Huan ^a   Chen, Chih Hsin ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b National Science Council   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Electron beam coevaporation; Optical mixed film; Optical thin film

Indexed keywords

EID: 0001946702     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.000090     Document Type: Article

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