Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Gallais, Laurent ^a   Capoulade, Jérémie ^a   Natoli, Jean Yves ^a   Commandrée, Mireille ^a   Cathelinaud, Michel ^a   Koc, Cian ^a   Lequime, Michel ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; DEPOSITION; ELECTRON BEAMS; FUSED SILICA; HAFNIUM OXIDES; ION BEAMS; ION IMPLANTATION; IONS; PULSED LASERS; REFRACTIVE INDEX; SPUTTERING; TESTING; ULTRAFAST LASERS;

DUAL ION BEAM SPUTTERING; ELECTRON BEAM DEPOSITIONS; EXTINCTION COEFFICIENTS; FUSED SILICA SUBSTRATES; LASER DAMAGE RESISTANCE; LASER DAMAGE THRESHOLD; PHOTOTHERMAL DEFLECTIONS; REACTIVE LOW VOLTAGE ION PLATINGS;

LASER DAMAGE;

EID: 45549100439     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C107     Document Type: Article

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