Growth and characterization of Sr-doped Cu2O thin films deposited by metalorganic chemical vapor deposition

Physica Status Solidi (A) Applications and Materials Science

Volumn 212, Issue 8, 2015, Pages 1735-1741

  Bergerot, Laurent ^a   Jiménez, Carmen ^a   Chaix Pluchery, Odette ^a   Rapenne, Laetitia ^a   Deschanvres, Jean Luc ^a  

^a UNIV GRENOBLE ALPES   (France)

Author keywords

Cu2O; doping; electrical properties; p type transparent conducting oxides; strontium; thin films

Indexed keywords

CONDUCTIVE FILMS; COPPER OXIDES; DOPING (ADDITIVES); ELECTRIC PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; OPTICAL PROPERTIES; SEMICONDUCTOR DOPING; STRONTIUM; STRONTIUM COMPOUNDS; TRANSPARENT CONDUCTING OXIDES;

CU2O; CU2O FILMS; DOMINANT FACTOR; FILM PROPERTIES; IMPURITY PHASE; P-TYPE; SR DOPED;

THIN FILMS;

EID: 84938966424     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201431750     Document Type: Article

References (45)

1. H. Kawazoe, H. Yanagi, K. Ueda, and, H. Hosono, MRS Bull. 25, 28-36 (2000).
2. E. Fortunato, P. Barquinha, and, R. Martins, Adv. Mater. 24, 2945-2986 (2012).
3. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and, H. Hosono, Nature 389, 939-942 (1997).
4. H. Yanagi, H. Kawazoe, A. Kudo, M. Yasukawa, and, H. Hosono, J. Electroceram. 4, 407-414 (2000).
5. A. Kudo, H. Yanagi, H. Hosono, and, H. Kawazoe, Appl. Phys. Lett. 73, 220-222 (1998).
6. H. Ohta, M. Orita, M. Hirano, I. Yagi, K. Ueda, and, H. Hosono, J. Appl. Phys. 91, 3074-3078 (2002).
7. L.-C. Chen, Mater. Sci. Semicond. Process. 16, 1172-1185 (2013).
8. M. Izaki, K. Mizuno, T. Shinagawa, M. Inaba, and, A. Tasaka, J. Electrochem. Soc. 153, C668-C672 (2006).
9. H. Wei, H. Gong, Y. Wang, X. Hu, L. Chen, H. Xu, and, B. Cao, Cryst. Eng. Commun. 13, 6065-6070 (2011).
10. S. Y. Kim, C. H. Ahn, J. H. Lee, Y. H. Kwon, S. Hwang, J. Y. Lee, and, H. K. Cho, ACS Appl. Mater. Interf. 5, 2417-2421 (2013).
11. Z. Q. Yao, S. L. Liu, L. Zhang, B. He, A. Kumar, X. Jiang, W. J. Zhang, and, G. Shao, Appl. Phys. Lett. 101, 042114 (2012).
12. E. Fortunato, V. Figueiredo, P. Barquinha, E. Elamurugu, R. Barros, G. Goncalves, S.-H. K. Park, C.-S. Hwand, and, R. Martins, Appl. Phys. Lett. 96, 192102 (2010).
13. K. M. D. C. Jayathilaka, V. Kapaklis, W. Siripala, and, J. K. D. S. Jayanetti, Electron. Mater. Lett. 10, 379-382 (2014).
14. S. Haller, J. Jung, J. Rousset, and, D. Lincot, Electrochim. Acta. 82, 402-407 (2012).
15. G. Riveros, A. Garmendia, D. Ramirez, M. Tejos, P. Grez, H. Gomez, and, E. A. Dalchiele, J. Electrochem. Soc. 160, D28-D33 (2013).
16. V. Figueiredo, E. Elangovan, G. Goncalves, P. Barquinha, L. Pereira, N. Franco, E. Alves, R. Martins, and, E. Fortunato, Appl. Surf. Sci. 254, 3949-3954 (2008).
17. V. Figueiredo, E. Elangovan, G. Goncalves, N. Franco, E. Alves, S. H. K. Park, R. Martins, and, E. Fortunat, Phys. Status Solidi A 206, 2143-2148 (2009).
18. C. Ooi, and, G. K. L. Goh, Thin Solid Films 518, E98-E100 (2010).
19. L. M. Wong, S. Y. Chiam, J. Q. Huang, S. J. Wang, J. S. Pan, and, W. K. Chim, J. Appl. Phys. 108, 033702 (2010).
20. F. M. Li, R. Waddingham, W. I. Milne, A. J. Flewitt, S. Speakman, J. Dutson, S. Wakeham, and, M. Thwaites, Thin Solid Films 520, 1278-1284 (2011).
21. H.-C. Lu, C.-L. Chu, C.-Y. Lai, and, Y.-H. Wang, Thin Solid Films 517, 4408-4412 (2009).
22. P. Goel, G. Duragasi, and, J. P. Singh, J. Mater. Sci. 48, 4876-4882 (2013).
23. N. Gupta, R. Singh, F. Wu, J. Narayan, C. McMillen, G. F. Alapatt, F. Poole, S.-J. Kelvin, D. Hwu, M. Sulejmanovic, G. Young, S. H. Teeter, and, S. Ullan, J. Mater. Res. 28, 1740-1746 (2013).
24. S. Eisermann, A. Kronenberger, A. Laufer, J. Bieber, G. Haas, S. Lautenschlaeger, G. Homm, P. J. Klar, and, B. K. Meyer, Phys. Status Solidi A 209, 531-536 (2012).
25. S. Jeong, and, E. S. Aydil, J. Vac. Sci. Technol. A 28, 1338-1343 (2010).
26. Z. Zang, A. Nakamura, and, J. Temmyo, Mater. Lett. 92, 188-191 (2013)
27. B. B. Li, L. Lin, H. L. Shen, F. E. Boafo, Z. F. Chen, B. Liu, and, R. Zhang, Eur. Phys. J. Appl. Phys. 58, 20303 (2012).
28. Y. Nakano, S. Saeki, and, T. Morikawa, Appl. Phys. Lett. 94, 022111 (2009).
29. B. Heng, T. Xiao, W. Tao, X. Hu, X. Chen, B. Wang, D. Sun, and, Y. Tang, Cryst. Growth Des. 12, 3998-4005 (2012).
30. L. Q. Pan, H. Zhu, C. F. Fan, W. G. Wang, Y. Zhang, and, J. Q. Xiao, J. Appl. Phys. 97, 10D318 (2005).
31. N. Kikuchi, and, K. Tonooka, Thin Solid Films 486, 33-37 (2005).
32. F. Biccari, C. Malerba, and, A. Mittiga, Sol. Energy Mater. Sol. Cells 94, 1947-1952 (2010).
33. M. Nolan, and, S. D. Elliott, Chem. Mater. 20, 5522-5531 (2008).
34. J. Ayache, and, P. H. Albarède, Ultramicroscopy 60, 195-206 (1995).
35. L. Pauling, The Nature of the Chemical Bond and the Structure of Molecules and Crystals: An Introduction to Modern Structural Chemistry (Cornell University Press, New York, 1948).
36. E. I. Tsyganova, and, L. M. Dyagileva, Uspekhi Khimii 65, 334-349 (1996).
37. R. Muller, and, M. Sand, Colors Appl. Opt. 26, 5211-5220 (1987).
38. H. Solache-Carranco, G. Juarez-Diaz, M. Galvan-Arellano, J. Martinez-Juarez, G. Romero-Paredes, and, R. Pena-Sierra, 5th International Conference on Electrical Engineering, Computing Science and Automatic Control, 2008, pp. 421-424.
39. H. Hagemann, H. Bill, W. Sadowski, E. Walker, and, M. François, Solid State Commun. 73, 447-451 (1990).
40. J. F. Xu, W. Ji, Z. X. Shen, W. S. Li, S. H. Tang, X. R. Ye, D. Z. Jia, and, X. Q. Xin, J. Raman Spectrosc. 30, 413-415 (1999).
41. D. M. Fernandes, R. Silva, A. A.W. Hechenleitner, E. Radovanovic, M. A. C. Melo, and, E. A. G. Pineda, Mater. Chem. Phys. 115, 110-115 (2009).
42. A. Khan, C. Jiménez, O. Chaix-Pluchery, H. Roussel, and, J. L. Deschanvres, Thin Solid Films 541, 136-141 (2013).
43. A. Khan, C. Jimenez, O. Chaix-Pluchery, H. Roussel, and, J.-L. Deschanvres, Phys. Status Solidi A 210, 2569-2574 (2013).
44. A. Chen, H. Long, X. Li, Y. Li, G. Yang, and, P. Lu, Vacuum 83, 927-930 (2009).
45. J. Ghisjen, L. H. Tjeng, J. van Elp, H. Eskes, J. Westerink, G. A. Sawatzky, and, M. T. Czyzyk, Phys. Rev. B 38, 11322-11330 (1988).