Copper(I) oxide micro-cubical structures formation by metal organic chemical vapor deposition from copper(II) acetylacetonate

Journal of Materials Science

Volumn 48, Issue 14, 2013, Pages 4876-4882

  Goel, Pratibha ^a   Duragasi, Ganesh ^a   Singh, J P ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION METHODS; HORIZONTAL FLOWS; SCANNING ELECTRON MICROSCOPE; SOLAR-CELL APPLICATIONS; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTING OXIDE ELECTRODES; TUBULAR FURNACES; VISIBLE SPECTRAL REGIONS;

CONDUCTIVE FILMS; COPPER DEPOSITS; DEPOSITS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; VAPORS;

COPPER;

EID: 84877816069     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-013-7267-z     Document Type: Article

References (36)

1. Briskman RN (1992) Sol Energy Mater Sol Cells 27:361
2. Hara M, Kondo T, Komoda M, Ikeda S, Shinohara K, Tanaka A, Kondo JN, Domen K (1998) Chem Commun 3:357
3. Poizot P, Laruelle S, Grugeon S, Dupont L, Tarascon JM (2000) Nature 407:496
4. Zhang J, Liu J, Peng Q, Wang X, Li Y (2006) Chem Mater 18:867
5. Liu R, Kulp EA, Oba F, Bohannan EW, Ernst F, Switzer JA (2005) Chem Mater 17:725
6. Musa AO, Akomolafe T, Carter MJ (1998) Sol Energy Mater Sol Cells 51:305
7. McFadyen P, Matijevic E (1973) J Colloid Interface Sci 44:95
8. Gou L, Murphy CJ (2003) Nano Lett 3:231
9. Wang Z, Chen X, Liu J, Mo M, Yang L, Qian Y (2004) Solid State Commun 130:585
10. Luo F, Wu D, Gao L, Lian S, Wang E, Kang Z, Lan Y, Xu L (2005) J Cryst Growth 285:534
11. Yao WT, Yu SH, Zhou Y, Jiang J, Wu QS, Zhang L, Jiang J (2005) J Phys Chem B 109:14011
12. Piana S, Reyhani M, Gale JD (2005) Nature 438:70
13. Brush LN, Sekerka RF (1989) J Cryst Growth 96:419
14. Nada H, Furukawa Y (2005) J Cryst Growth 283:242
15. Tsepelin V, Alles H, Babkin A, Jochemsen R, Parshin AY, Todoshchenko IA (2002) Phys Rev Lett 88:045302(1-4)
16. Glicksman ME, Singh NB (1989) J Cryst Growth 98:277
17. Maruyama T (1998) Jpn J Appl Phys 37:4099
18. Kumar M, Singh VN, Mehta BR, Singh JP (2009) Nanotechnology 20:235608(1-7)
19. Ottosson M, Lu J, Carlsson J (1995) J Cryst Growth 151:305
20. Markworth PR, Liu X, Dai JY, Fan W, Marks TJ, Chang RPH (2001) J Mater Res 16:2408
21. Tonneau D, Piemsnard R, Dallaporta H, Marine W (1995) J Phys 5:629-635
22. Tsyganova EI, Mazurenko GA, Drobotenko VN, Dyagileva LM, Aleksandrov YA, (1992) Zh Obshch Khim 62:499-504 [(1992) J Gen Chem 62:407-412]
23. Klug H, Alexander L (1962) X-ray diffraction procedures. Wiley, New York, p 125
24. Shackelford JF, Alexander W (2000) CRC materials science and engineering handbook. CRC Press, Boca Raton, p 289
25. Thompson JC, Younglove BA (1961) J Phys Chem Solids 112:146
26. Prakash C (1978) Microelectron Reliab 18:333
27. Liu YL, Liu YC, Mu R, Yang H, Shao CL, Zhang JY, Lu YM, Shen DZ, Fan XW (2005) Semicond Sci Technol 20:44
28. Nasibulin AG, Altman IS, Kauppinen EI (2003) Chem Phys Lett 367:771
29. Nasibulin AG, Richard O, Kauppinen EI, Brown DP, Jokiniemi JK, Altman IS (2002) Aerosol Sci Technol 36:899
30. Nagase K, Zheng Y, Kodama Y, Kakuta J (1999) J Catal 187:123
31. Kubaschewski O, Cibula A (1970) Gases and metals. LLIFFE, London, p 32
32. Nasibulin AG, Ahonen PP, Richard O, Kauppinen EI, Altman IS (2001) J Nanopart Res 3:385
33. Wullf G (1901) Z Kristallogr 34:449
34. Wang ZL (2000) J Phys Chem B 104:1153
35. Padyath R, Seth J, Babu SV (1994) Thin Solid Films 239:8
36. Drobny VF, Pulfrey DL (1979) Thin Solid Films 61:89