Controlled growth and characteristics of single-phase Cu2O and CuO films by pulsed laser deposition

Vacuum

Volumn 83, Issue 6, 2009, Pages 927-930

  Chen, Aiping ^a   Long, Hua ^a   Li, Xiangcheng ^a   Li, Yuhua ^a   Yang, Guang ^a   Lu, Peixiang ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Copper oxide thin films; Optical properties; Pulsed laser deposition; X ray diffraction

Indexed keywords

COPPER OXIDES; DIFFRACTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INFRARED SPECTROSCOPY; LASERS; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; SUBSTRATES; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTROLLED GROWTH; COPPER OXIDE THIN FILMS; FOURIER TRANSFORM INFRARED (FT-IR); LASER DEPOSITIONS; OXYGEN PRESSURES; REFLECTANCE SPECTRUM; SI(1 0 0 ); SUBSTRATE TEMPERATURE (ST);

COPPER;

EID: 58749086184     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.10.003     Document Type: Article

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