Removal of Organic Contamination from Graphene with a Controllable Mass-Selected Argon Gas Cluster Ion Beam

Journal of Physical Chemistry C

Volumn 119, Issue 31, 2015, Pages 17836-17841

  Tyler, Bonnie J ^a   Brennan, Barry ^a   Stec, Helena ^a   Patel, Trupti ^a   Hao, Ling ^a   Gilmore, Ian S ^a   Pollard, Andrew J ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; CLEANING; ESTERS; GRAPHENE; IONIZATION OF GASES; IONS; KINETIC ENERGY; KINETICS;

CARBONACEOUS MATERIALS; CHEMICAL VAPOR DEPOSITIONS (CVD); INTRINSIC PROPERTY; LARGE SCALE PRODUCTIONS; ORGANIC CONTAMINANT; ORGANIC CONTAMINATION; PEAK INTENSITY RATIO; POLY(METHYL METHACRYLATE) (PMMA);

ION BEAMS;

EID: 84938701978     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/acs.jpcc.5b03144     Document Type: Article

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