Cluster size dependence of etching by reactive gas cluster ion beams

AIP Conference Proceedings

Volumn 1066, Issue , 2008, Pages 427-430

  Toyoda, Noriaki ^a   Yamada, Iaso ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Gas cluster ion; Size dependence; Sputtering

Indexed keywords

EID: 85051519380     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3033654     Document Type: Conference Paper

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